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Fabrication of Metasurfaces in Standard CMOS Foundry Processes
This invention discloses a novel approach to integrating metasurfaces with standard Complementary Metal-Oxide-Semiconductor (CMOS) processes, a significant advancement in the field of photonics and nanofabrication. This approach leverages a bulk CMOS foundry process for the fabrication of metasurfaces and experimental results show that three primary...
Published: 5/7/2024
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Inventor(s): Mohamed ElKabbash
Keywords(s):
Category(s): Technology Classifications > Engineering & Physical Sciences > Photonics, Technology Classifications > Engineering & Physical Sciences > Semiconductors, Technology Classifications > Imaging & Optics > Materials & Fabrication
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Suspended Nanomembrane-Based EUV Lithography System with Diffractive Optical Elements and Transmission Masks
This invention addresses a critical bottleneck in advanced CMOS node development by providing a more efficient and cost-effective solution for extreme ultraviolet (EUV) lithography. The current EUV lithography tools are not only extremely expensive, often costing billions of dollars, but also complex and large. By introducing a suspended nanomembrane-based...
Published: 5/7/2024
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Inventor(s): Mohamed ElKabbash
Keywords(s):
Category(s): Technology Classifications > Imaging & Optics > Materials & Fabrication, Technology Classifications > Engineering & Physical Sciences > Photonics
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Solvent-Free Silsesquioxane for 3D Printing Glass Optics
3D printing of glass has demonstrated potential in diverse fields, such as photonics, imaging, and microfluidics. Researchers at the University of Arizona have developed a solvent-free polymeric silsesquioxane (PSQ) resin for 3D printing glass objects with high precision through a two-photon polymerization (TPP) method. The PSQ resin exhibits reduced...
Published: 4/24/2024
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Inventor(s): Rongguang Liang, Piaoran Ye, Zhihan Hong, Douglas Loy
Keywords(s):
Category(s): Technology Classifications > Engineering & Physical Sciences > Photonics, Technology Classifications > Engineering & Physical Sciences > Industrial & Manufacturing, Technology Classifications > Imaging & Optics > Optical Fab / Metrology, Technology Classifications > Imaging & Optics > Materials & Fabrication
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Advanced Radiative Cooling System for CMOS Chips Using Integrated Metal-Optic Layers
This invention leverages recent advancements in nanophotonics and electronics to develop an advanced radiative cooling system for Complementary Metal-Oxide-Semiconductor (CMOS) chips with minimal change to the CMOS chip design. This cooling system incorporates metal-optic layers directly into the chip’s architecture within bulk CMOS foundry processes,...
Published: 4/24/2024
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Inventor(s): Mohamed ElKabbash
Keywords(s):
Category(s): Technology Classifications > Engineering & Physical Sciences > Photonics, Technology Classifications > Engineering & Physical Sciences > Semiconductors, Technology Classifications > Imaging & Optics > Materials & Fabrication
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An Efficient Method to Estimate Parameters of the Cavity on Integrated Photonic Chips
This technology is a method for estimating parameters of the cavity on integrated photonic chips. This innovative approach simplifies the estimation process, offering a practical and reliable solution for manufacturers in the industry to help streamline testing procedures. With its simplicity and efficiency, this technology saves valuable time and resources,...
Published: 3/6/2024
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Inventor(s): Chaohan Cui, Linran Fan
Keywords(s):
Category(s): Technology Classifications > Imaging & Optics, Technology Classifications > Imaging & Optics > Materials & Fabrication
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UV-Curable Thiol-ene System for Broadband Infrared Transparent Objects
This invention is a UV-curable Thiol-ene system that marks a significant advancement in the production of infrared (IR) transparent materials. This solution harnesses an original thiol-ene strategy, which employs a meticulously designed combination of multithiols and divinyl oligomers (DVO). These components are exclusively comprised of C, H, and S...
Published: 1/10/2024
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Inventor(s): Rongguang Liang, Piaoran Ye, Zhihan Hong, Douglas Loy
Keywords(s):
Category(s): Technology Classifications > Imaging & Optics > Materials & Fabrication
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High-Throughput 3D Printing System
This invention is a high-throughput 3D printing system that employs a multi-head configuration, complemented by custom objectives designed for an expanded field of view (FOV). This approach uses a custom-designed microscope objective with expanded FOV for greater accuracy during production. The system results in a significant increase in 3D printing...
Published: 12/20/2023
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Inventor(s): Rongguang Liang, Zhihan Hong, Piaoran Ye
Keywords(s):
Category(s): Technology Classifications > Engineering & Physical Sciences > MEMS & Nanotechnology, Technology Classifications > Imaging & Optics > Materials & Fabrication
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3D Printing of Anisotropic Material with Tunable Electric and Magnetic Field
This invention proposes a new method and print head design to manufacture complex 3D structures by using anisotropic materials. The technique consists of controlling both the shape and alignment of the anisotropic material by using applied electric and/or magnetic fields. With this method an object can be created layer by layer with different materials...
Published: 11/9/2023
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Inventor(s): Stanley Pau
Keywords(s):
Category(s): Technology Classifications > Imaging & Optics > Materials & Fabrication, Technology Classifications > Engineering & Physical Sciences > Industrial & Manufacturing
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Periodic Structures Embedded within Glass Mirror Substrates for Reflection to Non-Specular Directions
This technology is a method for measuring heliostats for solar energy applications, as well as any large optical surface composed of second-surface mirrors. A small diffraction grating, which is a 1D, 2D, or 3D periodic phase and/or amplitude modulation, is embedded within the glass substrate of a second-surface mirror. Light from a metrology system...
Published: 4/24/2024
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Inventor(s): Brandon Chalifoux
Keywords(s):
Category(s): Technology Classifications > Imaging & Optics > Materials & Fabrication, Technology Classifications > Imaging & Optics > Lens & System Design
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Method to Reduce Polarization Aberration in Metal Mirror and Metal Mirror Device
This invention removes the diattenuation and retardance of a metal coated mirror using an additional uniaxial birefringent coating and anti-reflection coating. The method can additionally improve the angular response of any metal coated mirror by reducing the variation of the polarization aberration with angle. The invention includes coating designs,...
Published: 1/31/2024
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Inventor(s): Stanley Pau, Sawyer Miller, Linan Jiang
Keywords(s):
Category(s): Technology Classifications > Imaging & Optics > Materials & Fabrication, Technology Classifications > Imaging & Optics > Microscopy, Spectroscopy, Polarimetry
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