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Fabrication of Metasurfaces in Standard CMOS Foundry Processes

This invention discloses a novel approach to integrating metasurfaces with standard Complementary Metal-Oxide-Semiconductor (CMOS) processes, a significant advancement in the field of photonics and nanofabrication. This approach leverages a bulk CMOS foundry process for the fabrication of metasurfaces and experimental results show that three primary...

Published: 5/7/2024 | Inventor(s): Mohamed ElKabbash

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Category(s): Technology Classifications > Engineering & Physical Sciences > Photonics, Technology Classifications > Engineering & Physical Sciences > Semiconductors, Technology Classifications > Imaging & Optics > Materials & Fabrication

Suspended Nanomembrane-Based EUV Lithography System with Diffractive Optical Elements and Transmission Masks

This invention addresses a critical bottleneck in advanced CMOS node development by providing a more efficient and cost-effective solution for extreme ultraviolet (EUV) lithography. The current EUV lithography tools are not only extremely expensive, often costing billions of dollars, but also complex and large. By introducing a suspended nanomembrane-based...

Published: 5/7/2024 | Inventor(s): Mohamed ElKabbash

Keywords(s):

Category(s): Technology Classifications > Imaging & Optics > Materials & Fabrication, Technology Classifications > Engineering & Physical Sciences > Photonics

Advanced Radiative Cooling System for CMOS Chips Using Integrated Metal-Optic Layers

This invention leverages recent advancements in nanophotonics and electronics to develop an advanced radiative cooling system for Complementary Metal-Oxide-Semiconductor (CMOS) chips with minimal change to the CMOS chip design. This cooling system incorporates metal-optic layers directly into the chip’s architecture within bulk CMOS foundry processes,...

Published: 4/24/2024 | Inventor(s): Mohamed ElKabbash

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