Invention:
This technology is a novel dual-focus metalens system for lithography applications. It uses as polarization-dependent metalens to focus light from a single source onto two separate reticles. This system can complete two parallel patterning tasks simultaneously, allowing for twice the throughput of traditional lithography systems. This, in turn, allows for increased efficiency in high-precision lithography-enabled processes like semiconductor fabrication. Furthermore, unlike current dual-focus lithography setups which require multiple light sources, this system uses only one light source and one metalens, making it a significantly less complex solution.
Background:
This technology aims to increase the throughput and efficiency of extreme ultraviolet (EUV) lithography systems with a dual-lens approach. Existing dual-lens technologies require additional light sources and lenses, making them complex and decreasing their efficiency. This technology uses only one light source and one polarization-dependent metalens which focuses orthogonal polarization components of incident light onto two distinct reticles for a simpler, more efficient EUV lithography system.
Applications:
- Lithography
- Micro- and nano-lithography
- Semiconductor fabrication
- Advanced imaging
- Photonics
- Holography
- Optical data storage
- Parallel optical computing / processing systems
Advantages:
- Increased throughput
- Compact design
- More efficient
- Versatile, can be adapted for use in various photonic and optoelectronic applications
