Invention:
Researchers at the University of Arizona have developed an interferometer that operates at 121.6 nm, wherein the sample is outside the vacuum and only the source itself is enclosed in a vacuum. This allows the instrument to be used in lithography without the need to create a large vacuum chamber to hold the sample and instrument during writing or inspection. Non-destructive optical inspection techniques become viable with very high resolution and no need for a high vacuum.
Background:
Optical microscopes and interferometry are useful in life sciences, physical sciences and semi-conductor manufacturing. It would be advantageous if a new interferometer system could be developed using vacuum ultraviolet wavelengths without the complicated and expensive equipment to support a high vacuum for the system.
Applications:
- interferometry
- lithography
- surface testing metrology
Advantages:
- No need for a vacuum environment for the sample.
- Very high resolution
- Non-destructive optical testing
Status: issued U.S. patent #9,081,193
