Invention:
This technology is a method of transforming standard digital micromirror devices (DMDs), which are compatible with visible and near-infrared light, into DMDs suitable for extreme ultraviolet (EUV) applications. This is done by depositing EUV-compatible mirrors onto each micromirror of a standard DMD. The resulting EUV-compatible DMD yields an efficient way to reflect EUV light and can be used in advanced EUV lithography systems to improve speed and resolution. This enables the use of the high-speed rotational capabilities of the micromirrors for rapid and accurate light modulation, which essential for advanced lithographic techniques such as maskless EUV lithography systems.
Background:
Currently, digital micromirror devices (DMDs) are used primarily for visible light applications such as projector and display technology. DMDs have been integral in display technologies and optical systems because of their ability to rapidly switch and modulate visible and near-infrared light. However, their traditional coatings are unsuitable for EUV wavelengths required in next-generation semiconductor fabrication. EUV lithography, which is necessary for producing smaller and more complex semiconductor circuits, requires materials that can efficiently reflect and manipulate light at these shorter wavelengths. By placing EUV-compatible mirrors on the micromirrors of a standard DMD, this technology overcomes this limitation and makes the use of DMDs in advanced EUV lithography applications possible.
Applications:
- EUV lithography
- High-resolution imaging
- Semiconductor circuits
Advantages:
- Rapid modulation
- Precise, high-resolution functionality
- Cost-effective
