Invention:
This technology is a unique solution for meta/flat optics metrology. It utilizes a direct matching interface between the flat/meta optics and the modulated pattern display. This allows for a much wider dynamic range than current technologies. This also enables higher measurement accuracy than current solutions like interferometry and traditional deflectometry at a lower price. By directly interfacing with the optics under test, this method ensures precise alignment and improved data quality, making it ideal for advanced optical engineering applications.
Background:
Meta-optics are devices made up of millions of nanostructures that are smaller than a wave of light, enabling them to manipulate light on a much smaller scale than a traditional lens. They enable many of the technologies relied on by modern society, from smartphone cameras to microscope lenses. The field of optics metrology has relied on techniques such as interferometry and traditional deflectometry. While effective, these methods often encounter limitations in dynamic range and accuracy, leading to increased costs and measurement uncertainties. Current meta-optics metrology solutions are limited by a small dynamic range, large uncertainty, and high cost. This technology provides a novel solution with high dynamic range and high accuracy at a lower price than current solutions.
Applications:
- Meta/flat optics metrology
- Optical metrology
- Manufacturing
- Consumer electronics
- Telecommunications
Advantages:
- Wider dynamic range
- Increased accuracy
- Less expensive
- Scalable
